Trans-Imager | Translating process images into significant tool-defect reduction
Real-time, tool-specific defectivity data
Now there is a way to monitor defectivity on individual processing tools – automatically – in real-time. Microtronic’s new Trans-Imager software module is able to take high-resolution images directly from your processing equipment and immediately detect and display
macro wafer defects – transferring all of that information into our powerful and long-proven ProcessGuard software, which provides a wealth of defect management and analysis. This new capability is called ProcessGuard Xtensis (PGX) because it extends the power of ProcessGuard software to fab tools that previously had no way to detect defects. This provides an important new stream of defect data.
Microtronic’s new Trans-Imager software
Trans-Imager Software | A powerful defect management system
Trans-Imager puts all of your information into the macro-image database, and ProcessGuard software makes it immediately accessible across the entire fab. Tool defect data is searchable by date, time, lot, wafer, and more. So, even months later, specific process issues can
be quickly and easily reviewed.
Microtronic Trans-Imager Software – Zoomed-in view of defects
ProcessGuard is a high-speed, high-volume solution that delivers an easy-to-use and extendable means of integrating and managing all of your fab’s inspection processes. It provides the flexibility to customize the user interface and application features to your needs. It includes a user-definable defect library, a slot-positional analysis tool, the ability to guardband wafers at probe, and a great deal more. Now, all the capability and intelligence of ProcessGuard can be applied directly to specific processes in your fab.
Trans-Imager
Trans-Imager | Translating process images into significant tool-defect reduction
Real-time, tool-specific defectivity data
Now there is a way to monitor defectivity on individual processing tools – automatically – in real-time. Microtronic’s new Trans-Imager software module is able to take high-resolution images directly from your processing equipment and immediately detect and display
macro wafer defects – transferring all of that information into our powerful and long-proven ProcessGuard software, which provides a wealth of defect management and analysis. This new capability is called ProcessGuard Xtensis (PGX) because it extends the power of ProcessGuard software to fab tools that previously had no way to detect defects. This provides an important new stream of defect data.
Microtronic’s new Trans-Imager software
Trans-Imager Software | A powerful defect management system
Trans-Imager puts all of your information into the macro-image database, and ProcessGuard software makes it immediately accessible across the entire fab. Tool defect data is searchable by date, time, lot, wafer, and more. So, even months later, specific process issues can
be quickly and easily reviewed.
Microtronic Trans-Imager Software – Zoomed-in view of defects
ProcessGuard is a high-speed, high-volume solution that delivers an easy-to-use and extendable means of integrating and managing all of your fab’s inspection processes. It provides the flexibility to customize the user interface and application features to your needs. It includes a user-definable defect library, a slot-positional analysis tool, the ability to guardband wafers at probe, and a great deal more. Now, all the capability and intelligence of ProcessGuard can be applied directly to specific processes in your fab.
Trans-Imager Software Features :
TRANS-IMAGER SOFTWARE | TRANSLATING PROCESS IMAGES INTO SIGNIFICANT TOOL-DEFECT REDUCTION PDF
Contact us today for a demonstration of Microtronic’s Trans-Imager software module or any of our other semiconductor wafer defect inspection systems.
Download Microtronic Macro Defect Brochure
Microtronic Overview Video
Gallery of Macro Defects Detected By EAGLEview
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
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