MicroView allows microscope and other images to be captured and stored in the EAGLEview database along with the macro images. MicroView provides a repository for storing/reviewing images and will be archived with the lot data for easy retrieval years later.
External MicroView
This option integrates a Microtronic supplied camera onto your existing microscope allowing microscope images to be imported from a remote ProcessGuard Client anywhere. This microscope can be across the fab, in another building or at another site.
Internal MicroView
This option integrates a microscope camera into the Microtronic EAGLEview platform. Upon completion of the macro inspection, users define which levels and/or devices will have microscope images captured.
A Brightfield (BF) and Darkfield (DF) is captured and stored in the database with the wafer macro image.
MicroView (Internal & External Microscope Options)
MicroView Camera Capture
MicroView allows microscope and other images to be captured and stored in the EAGLEview database along with the macro images. MicroView provides a repository for storing/reviewing images and will be archived with the lot data for easy retrieval years later.
External MicroView
This option integrates a Microtronic supplied camera onto your existing microscope allowing microscope images to be imported from a remote ProcessGuard Client anywhere. This microscope can be across the fab, in another building or at another site.
Internal MicroView
This option integrates a microscope camera into the Microtronic EAGLEview platform. Upon completion of the macro inspection, users define which levels and/or devices will have microscope images captured.
A Brightfield (BF) and Darkfield (DF) is captured and stored in the database with the wafer macro image.
Download Microtronic Macro Defect Brochure
Microtronic Overview Video
Gallery of Macro Defects Detected By EAGLEview
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
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