Microtronic introduced an innovative new way to automatically detect and manage wafer processing defects from inside specific types of processing tools. The new capability is called “ProcessGuard Xtensis” because it extends the power of ProcessGuard automatic defect detection to external images and data, expanding real-time excursion control and corrective actions throughout the fab.
The key to ProcessGuard Xtensis (PGX) is a very smart and fast new analytical software module called the Trans-Imager. In real-time, Trans-Imager is able to extract and automatically analyze wafer images from within a processing tool – without the need for recipes.
ProcessGuard Xtensis is offered as a stand-alone product or integrated into an existing EAGLEview platform.
Raw Infrared Image from a bonding tool on the left and the automatically detected defects using ProcessGuard Xtensis on the right.
ProcessGuard Xtensis (and Trans-Imager Modules)
Microtronic introduced an innovative new way to automatically detect and manage wafer processing defects from inside specific types of processing tools. The new capability is called “ProcessGuard Xtensis” because it extends the power of ProcessGuard automatic defect detection to external images and data, expanding real-time excursion control and corrective actions throughout the fab.
The key to ProcessGuard Xtensis (PGX) is a very smart and fast new analytical software module called the Trans-Imager. In real-time, Trans-Imager is able to extract and automatically analyze wafer images from within a processing tool – without the need for recipes.
ProcessGuard Xtensis is offered as a stand-alone product or integrated into an existing EAGLEview platform.
Raw Infrared Image from a bonding tool on the left and the automatically detected defects using ProcessGuard Xtensis on the right.
Download Microtronic Macro Defect Brochure
Microtronic Overview Video
Gallery of Macro Defects Detected By EAGLEview
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
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