Several examples of CMP related macro defects detected during an EAGLEview inspection run
There are a variety of CMP semiconductor wafer defects that are detected by Microtronic’s EAGLEview including residual defects, scratches, unpolished or insufficiciently polished semiductor wafers.
CMP – Macro Defects
CMP – Macro Defects
There are a variety of CMP semiconductor wafer defects that are detected by Microtronic’s EAGLEview including residual defects, scratches, unpolished or insufficiciently polished semiductor wafers.
Download Microtronic Macro Defect Brochure
Microtronic Overview Video
Gallery of Macro Defects Detected By EAGLEview
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
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