A poly haze macro defect appearing on a semiconductor wafer is caused by a poly deposition process problem that can be easily detected by the EAGLEview system. The poly haze macro defect appears as a bright spot on the semiconductor wafer’s edge. The wafer macro defect may effect a single wafer or many wafers in the lot as can be seen by the images above.
Poly Haze Macro Defect
Poly Haze Macro Defect
A poly haze macro defect appearing on a semiconductor wafer is caused by a poly deposition process problem that can be easily detected by the EAGLEview system. The poly haze macro defect appears as a bright spot on the semiconductor wafer’s edge. The wafer macro defect may effect a single wafer or many wafers in the lot as can be seen by the images above.
Download Microtronic Macro Defect Brochure
Microtronic Overview Video
Gallery of Macro Defects Detected By EAGLEview
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
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