Microtronic’s EAGLEviewIV Chosen as Finalist in “Best of West” Product Awards Program by Solid State Technology and SEMI at SEMICON West 2014
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Microtronic’s EAGLEviewIV Chosen as Finalist in “Best of West” Product Awards Program by Solid State Technology and SEMI at SEMICON West 2014
Microtronic’s EAGLEviewIV Chosen as Finalist in “Best of West” Product Awards Program by Solid State Technology and SEMI at SEMICON West 2014
Hawthorne, NY – July 5, 2014 – Microtronic Inc., a leading US-based manufacturer of semiconductor wafer inspection systems announced today that its EAGLEview IV automated macro defect inspection platform has been selected as a finalist in the 2014 Best of West Product Awards Program in the Metrology and Test category.
EAGLEview IV is Microtronic’s new 4-cassette auto macro defect inspection system with an advanced robotic handler that inspects over 3,000 wafers per day without the need to create or maintain recipes. A live, working EAGLEview IV system will be unveiled in Booth 729 at SEMICON West 2014.
Solid State Technology and SEMI, who are co-hosting the awards program this year, stated that, “the Best of West Award is given to recognize important product and technology developments in the microelectronics industries. Finalists and award recipients are selected based on the submission’s financial impact on the industry, engineering, or scientific achievement, or societal impact and benefits”.
The winner chosen from the finalists will be announced at 1:00pm July 9, 2014 at SEMICON West 2014.
About Microtronic Inc. Founded in 1994 the company is based in Hawthorne, NY and specializes in automated macro defect inspection systems, wafer sorters, and microscopy solutions for semiconductor wafter manufacturing. For a complete overview of EAGLEview IV and all of Microtronic’s innovative solutions visit microtronic.com
Contact: [email protected]
© Copyright Microtronic, Inc. 2013 All Rights Reserved
Download Microtronic Macro Defect Brochure
Microtronic Overview Video
Gallery of Macro Defects Detected By EAGLEview
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
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