Microtronic, Inc.
Contact Us:
1-877-642-7687
|
1-508-627-8951
[email protected]
Company
Company Overview
Innovation Highlights
Technologies
Applications
Wafer Randomization Modes
Customized Inspection Recipes
Customized Automatic Sorting
Skipping Manual Inspection
Guardbanding Capability
Excursion Control
ProcessGuard Defect Library
Transparent Wafer Imaging
ProcessGuard Xtensis (and Trans-Imager Modules)
Artificial Intelligence (AI) on CMP Edge Residual and Pin Hole Defects
MicroView (Internal & External Microscope Options)
Products
EagleView – Automated Macro Wafer Defect Inspection
ProcessGUARD – EagleView Desktop Client
Trans-Imager
SITEview Software – Defect Review, Images, and Sorting
MicroSORT – Stand Alone Wafer Sorter
MicroINSPECT – Microscope Wafer Inspection
MicroINSPECT 300FA – Failure Analysis
Customized Solutions
Technical Bulletins
Videos
Defect Library
News
Contact Us
Company
Company Overview
Innovation Highlights
Technologies
Applications
Wafer Randomization Modes
Customized Inspection Recipes
Customized Automatic Sorting
Skipping Manual Inspection
Guardbanding Capability
Excursion Control
ProcessGuard Defect Library
Transparent Wafer Imaging
ProcessGuard Xtensis (and Trans-Imager Modules)
Artificial Intelligence (AI) on CMP Edge Residual and Pin Hole Defects
MicroView (Internal & External Microscope Options)
Products
EagleView – Automated Macro Wafer Defect Inspection
ProcessGUARD – EagleView Desktop Client
Trans-Imager
SITEview Software – Defect Review, Images, and Sorting
MicroSORT – Stand Alone Wafer Sorter
MicroINSPECT – Microscope Wafer Inspection
MicroINSPECT 300FA – Failure Analysis
Customized Solutions
Technical Bulletins
Videos
Defect Library
News
Contact Us
Defect Library
Home
Defect Library
Defect Library
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
Wafer Hotspot Defects
First 12 Wafers – Different
Flashfield Defects
Wafer Edge Discoloration
Developer Related Defects
EBR Drip Defect
Wafer Contamination – Small
Wafer Contamination – Large
CMP – Macro Defects
Edge Chips – Macro Defects
Poor Rinse – Macro Defect
Blocked Etch Macro Defect
Backside Contamination
2 Chamber Macro Defect
Arcing Defects
3 Chamber Macro Defect
Download Microtronic Macro Defect Brochure
Microtronic Overview Video
https://youtu.be/DSluLdjR_-w
Gallery of Macro Defects Detected By EAGLEview
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
Navigation
Company
Applications
Products
Technical Bulletins
Videos
Defect Library
News
Contact Us
Social connect
Defect Library
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
Wafer Hotspot Defects
First 12 Wafers – Different
Flashfield Defects
Wafer Edge Discoloration
Developer Related Defects
EBR Drip Defect
Wafer Contamination – Small
Wafer Contamination – Large
CMP – Macro Defects
Edge Chips – Macro Defects
Poor Rinse – Macro Defect
Blocked Etch Macro Defect
Backside Contamination
2 Chamber Macro Defect
Arcing Defects
3 Chamber Macro Defect
Download Microtronic Macro Defect Brochure
Microtronic Overview Video
Gallery of Macro Defects Detected By EAGLEview
Reticle Tilt Defect
Spin Defect – Line
Spin Defect – Entire Wafer
Spin Defect on Edge
Center Spin Macro Defect
Scratches By Machine
Scratches By Human
Rework – Yield Improvement
Rework – Scrap Avoidance
Previous Layer Defects
Partial Pattern – No Expose
Poly Haze Macro Defect
Particle Defects
Missing Patterns
Lens Stepper Macro Defects
Navigation
Social connect